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圖形化襯底DPSS

2014-09-02

2"DPSS

Inspection

Item

Detail

Spec

Description

SEM
Image
Inspection

Width

Average

2.70±0.15um

Flat-top shaped pattern not allowed

Unif.

5%

Height

Average

1.65±0.15um

Unif.

5%

Scope Inspection

Particle

50um*

100ea

No visible particle on wafer
The total lens should be less than 3mm

[50um250um]*

30ea

[250um,500um]*

20ea

[500um,1500um]*

10ea

1500um*

0

Pattern Missing

50um*

80ea

The total length shoud be less than 2mm

[50um250um]*

30ea

[250um,500um]*

15ea

[500um,1500um]*

8ea

1500um*

0

Pattern Fail

50um*

80ea

[50um250um]*

30ea

[250um,500um]*

15ea

[500um,1500um]*

8ea

1500um*

0

Scratch

1.2mm

7ea

width60um and lenth1.2mm should be judged as 1ea
if the pattern link happenes in the nearest 20 patternes area from the scratch,the pattern link should not be counted

Edge Bead

Edge Bead

1.8mm

The pattern failed within the 1.8mm area from the wafer edge should not be counted
The non-pattern area should be less than1mm from the wafer edge

Abnormal Shape

Abnormal Shape

3%

Total area of abormal shape pattern should be less than 3%

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